Customization: | Available |
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Sample Type: | Solidity |
Processing Method: | Coating |
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Sputtering system | |
Sputtering Target | Au (Standard target), Pt (optional target),φ57mm x 0.1mmthk |
Standard sample stage | Can be loaded with 12 Sample holders, adjustable range of height is 60mm |
Sputtering current | Microprocessor control, security interlock, adjustable, current 5~30mA, programmed digital control |
Gauge table | Vacuum: Atm - 1*10-3 mbar, Current: 0~99mA |
Control method | Microprocessing controller (1-999s) with "Start" and "pause" buttons, automatic pumping, sputtering, automatically deflate after shutdown. |
Vacuum system | |
Pumping speed | 133L/MIN |
Ultimate Vacuum | 10-4 mbar |
Noise level | 56dB |